Edge exposure apparatus, edge exposure method and a substrate processing apparatus having the same

摘要

PROBLEM TO BE SOLVED: To provide an edge exposure device which can exactly carry out an exposure treatment for a predetermined area of the substrate circumference with simple configuration, an edge exposure method, and a substrate processing apparatus having it.;SOLUTION: The edge exposure device 100 includes a projector 10, a projector holding unit 20, a substrate rotating unit 40, and a substrate circumference detecting unit 50. The projector 10 is connected with a light source for exposing and projects the light supplied from the light source to the circumference of the substrate W. A projector holding guide 23 of the projector holding unit 20 moveably keeps the projector 10 in a Y direction. A lower portion of a supporting column 24 of the projector holding unit 20 is kept by a supporting column holding guide 32. The supporting column holding guide 32 moveably holds the supporting column 24 in a X direction. A CPU moves the projector 10 at a desired plane position by controlling operations of a Y direction driving motor 21 and a X direction driving motor 31 based on the data detected by the substrate circumference detecting unit 50.;COPYRIGHT: (C)2005,JPO&NCIPI