METHOD AND APPARATUS FOR PROCESSING AN EDGE OF A SUBSTRATE CAPABLE OF CHECKING AN EDGE EXPOSURE STATE OF THE SUBSTRATE THROUGH THE WIDTH OF AN EDGE EXPOSURE REGION DETECTED FROM IMAGES

摘要

PURPOSE: An apparatus and method for processing an edge of a substrate are provided to uniformly process a substrate surface by confirming an edge bead removing process and an edge exposing process.;CONSTITUTION: An index part(100) includes a load port, an index robot, and a first buffer module. A processing unit(200) includes a coating processing unit(200a) and a development processing unit(200b). The coating processing unit coats the substrate with photoresist before an exposure process. The development processing unit develops the substrate after the exposure process. An interface unit(700) transfers the substrate to the processing unit and an exposing device(900). The index part, the processing unit, the interface unit, and the exposing device are arranged in a row.;COPYRIGHT KIPO 2013