首页> 外国专利> The vibrating reed formation process which forms multiple tuning fork die vibrating reeds on the wafer making use of the tuning fork die vibrator null photolithography

The vibrating reed formation process which forms multiple tuning fork die vibrating reeds on the wafer making use of the tuning fork die vibrator null photolithography

机译:利用音叉模振子零光刻技术在晶片上形成多个音叉模振片的振动片形成工艺

摘要

PROBLEM TO BE SOLVED: To easily adjust an oscillation frequency even after mounting tuning fork type vibration reeds on a package to form a tuning fork type vibrator and further to easily perform fine adjustment of the oscillation frequency.;SOLUTION: A method for adjusting the oscillation frequency of the tuning fork type vibrator comprises a vibrating reed forming step for using a photolithographic method to form a plurality of vibrating reeds on a wafer; a laser emitting step for making point areas of tuning fork parts of the tuning fork type vibrating reeds irradiated with lasers to splash a portion of the point areas of the tuning fork parts; a film forming step for forming a metal film in the point areas of the tuning fork parts; a mounting step for cutting the plurality of tuning fork type vibrating reeds so as to be divided into individual tuning fork type vibrating reeds and adhering and mounting each of the cut tuning fork type vibrating reeds to/on the package to form the tuning fork type vibrator; and an etching step for using an ion milling method to etch the metal film formed in the point areas of the tuning fork parts. The respective steps are sequentially carried out to make the oscillation frequency of the tuning fork type vibrator coincide with a preset oscillation frequency.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:即使在将音叉型振动片安装在包装上以形成音叉型振动器之后,也易于调节振荡频率,并且进一步容易地对振荡频率进行微调。音叉型振动器的频率包括振动片形成步骤,该振动片形成步骤用于使用光刻方法在晶片上形成多个振动片。激光发射步骤,用于使用激光辐照的音叉型振动簧片的音叉部分的尖端区域飞溅到一部分音叉部分上;膜形成步骤,用于在音叉部的尖端区域形成金属膜。安装步骤,用于切割多个音叉型振动片,从而被分成单独的音叉型振动片,并且将切割后的音叉型振动片中的每一个粘附并安装到包装上/上,以形成音叉型振动器;蚀刻步骤,其使用离子铣削方法蚀刻形成在音叉部的尖端区域中的金属膜。依次执行各个步骤,以使音叉型振动器的振荡频率与预设的振荡频率一致。;版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP4039230B2

    专利类型

  • 公开/公告日2008-01-30

    原文格式PDF

  • 申请/专利权人 株式会社大真空;

    申请/专利号JP20020368398

  • 发明设计人 佐藤 俊介;

    申请日2002-12-19

  • 分类号H03H3/04;H03H9/02;

  • 国家 JP

  • 入库时间 2022-08-21 20:17:41

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