Irradiating the thin film null pulse laser which is produced with production manner and the same manner of the crystal thin film of the diamond

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a crystalline thin film of diamond such as a hetero-epitaxial thin film, and to provide a thin film manufactured by the method.;SOLUTION: In the method for manufacturing a crystalline thin film, an epitaxial, a uniaxially oriented, or a polycrystalline thin film of diamond is formed on a monocrystalline substrate made of sapphire, SrTiO₃, or the like other than diamond, which do not react with SiC and a substrate holder, by using an SiC target, using a substrate heating mechanism capable of heating the substrate to such a high temperature as in the region of 1,000°C, and using a film forming method employing a pulse laser abrasion method applying a pulse laser having a pulse width shorter than sub-nanosecond. A hetero-epitaxial thin film, a uniaxially oriented thin film, and a polycrystalline thin film of diamond are manufactured on the surfaces of those substrates by using the method for manufacturing the crystalline thin film.;COPYRIGHT: (C)2004,JPO&NCIPI