首页> 外国专利> Defect Resolution Methodology and Data Defects Quality/Risk Metric Model Extension

Defect Resolution Methodology and Data Defects Quality/Risk Metric Model Extension

机译:缺陷解决方法和数据缺陷质量/风险度量模型扩展

摘要

Methods, systems, and articles of manufacture for analyzing defects associated with a software development project. Descriptions of defects identified during the testing of a software product may be stored in a data structure. One or more of the defects may be identified as data defects. If data defects are determined to be the dominant class of defects in the data structure, the data defects may be analyzed to determine a cause for one or more data defects. For example, the focus areas affected by the defects, the trends over time of the defects, the particular types of the data defects, the stability of the system, etc. may be analyzed to determine a cause for the data defects. Therefore, corrective measures may be taken based on the identified cause of the one or more data defects.
机译:用于分析与软件开发项目相关的缺陷的方法,系统和产品。在软件产品的测试过程中发现的缺陷的描述可以存储在数据结构中。缺陷中的一个或多个可以识别为数据缺陷。如果确定数据缺陷是数据结构中缺陷的主要类别,则可以分析数据缺陷以确定一个或多个数据缺陷的原因。例如,可以分析受缺陷影响的焦点区域,缺陷随时间的趋势,数据缺陷的特定类型,系统的稳定性等,以确定引起数据缺陷的原因。因此,可以基于所识别的一个或多个数据缺陷的原因来采取纠正措施。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号