首页> 外国专利> Liquid Amount Monitoring Apparatus, Semiconductor Manufacturing Apparatus Having the Liquid Amount Monitoring Apparatus Mounted Thereon, and Liquid Material/Liquid Amount Monitoring Method

Liquid Amount Monitoring Apparatus, Semiconductor Manufacturing Apparatus Having the Liquid Amount Monitoring Apparatus Mounted Thereon, and Liquid Material/Liquid Amount Monitoring Method

机译:液体量监视设备,其上安装有液体量监视设备的半导体制造设备以及液体材料/液体量监视方法

摘要

A semiconductor manufacturing apparatus includes a container (Xb, Ab, Bb, or Cb) for receiving a liquid material, a liquid material supply section for supplying the liquid material from the container, a liquid vaporizing section for vaporizing the liquid material supplied from the liquid material supply section to generate a gas, a processing section for using the gas supplied from the liquid vaporizing section to execute deposition processing, an exhaust section for exhausting a gas from the processing section, and a liquid level detector (Xs, As, Bs, or Cs) arranged in a bottom of the container to detect a liquid level of the liquid material based on an acoustic wave.
机译:半导体制造装置包括:用于容纳液体材料的容器(Xb,Ab,Bb或Cb);用于从容器中供给液体材料的液体材料供给部;用于使从液体供给的液体材料气化的液体汽化部。产生气体的原料供给部,使用从液体气化部供给的气体进行沉积处理的处理部,用于从处理部排出气体的排气部,以及液位检测器(Xs,As,Bs,或Cs)布置在容器的底部,以基于声波检测液体材料的液位。

著录项

  • 公开/公告号US2007261735A1

    专利类型

  • 公开/公告日2007-11-15

    原文格式PDF

  • 申请/专利权人 AKIRA YASUMURO;HACHISHIRO IIZUKA;

    申请/专利号US20050577456

  • 发明设计人 AKIRA YASUMURO;HACHISHIRO IIZUKA;

    申请日2005-10-18

  • 分类号B01J4/00;H01L21/56;

  • 国家 US

  • 入库时间 2022-08-21 20:15:55

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