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PHOTOACTIVE MATERIALS CONTAINING BULK AND QUANTUM-CONFINED SEMICONDUCTOR STRUCTURES AND OPTOELECTRONIC DEVICES MADE THEREFROM

机译:包含大体积和量子限制的半导体结构以及由光电器件制成的光敏材料

摘要

The present invention provides photoactive materials that include quantum-confined semiconductor nanostructures in combination with non-quantum confined and bulk semiconductor structures to enhance or create a type II band offset structure. The photoactive materials are well-suited for use as the photoactive layer in photoactive devices, including photovoltaic devices, photoconductors and photodetectors.
机译:本发明提供了光敏材料,其包括与非量子约束和体半导体结构结合的量子限制的半导体纳米结构,以增强或产生II型能带偏移结构。所述光敏材料非常适合用作光敏器件中的光敏层,所述光敏器件包括光伏器件,光电导体和光电检测器。

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