Shield Components With Enhanced Thermal and Mechanical Stability

摘要

The invented shield components are used for a plasma processing system to adhere deposition materials or process residuals during wafer processing, thus preventing excessive wafer contamination, even when exposed to high temperatures. One embodiment of the invented shields consists of a reaction barrier layer to separate the underlying substrate from the overlying spray coating to prevent solid-state chemical reaction between the substrate and the coating. Another embodiment of the invented shields consists of a substrate and a coating with a substrate-coating combination chosen to allow no new solid-state phase to form at the interface. The invented shields have well-bonded materials interfaces that preserve thermal and mechanical stability under high temperature conditions in a plasma processing system for the containment of deposition contaminates.