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Nanostructured Indium-Doped Iron Oxide

机译:纳米结构的铟掺杂氧化铁

摘要

The present invention generally relates to materials that may be used to construct photoelectrodes. It more specifically relates to nanostructured indium-doped iron oxide materials that may be used as photoanodes in photoelectrochemical cells which catalyze the splitting of water into its component gasses using sunlight as the energy source. In a composition aspect, the present invention provides an indium-doped iron oxide film. The film ranges in thickness from 20 nm to 200 nm, and has less than 10% indium by weight, less than 10% Fe2O3 and In2O3 by weight and less than 10% indium ferrate by weight. There are at least 10 disc-like structures on the film surface within a 0.25 μm2 area, and the disc-like structures are roughly spherical in shape with a ratio of long dimension to short being at least 2:1. The radius of the disc-like structures ranges from 0.25 nm to 6 nm, and the disc-like structures are oriented at an angle between 20° and 160° relative to the film surface plane.
机译:本发明一般涉及可用于构造光电极的材料。更具体地,本发明涉及可以在光电化学电池中用作光阳极的纳米结构的铟掺杂的氧化铁材料,其利用阳光作为能源来催化水分解成其组成气体。在组成方面,本发明提供了铟掺杂的氧化铁膜。该膜的厚度范围为20 nm至200 nm,铟含量小于10%,Fe 2 O 3 和In 2小于10% O 3 (按重量计)和少于10%的高铁酸铟。膜表面上在0.25μm 2 区域内至少有10个盘状结构,并且该盘状结构的形状大致为球形,长径与短径之比至少为2 :1。盘状结构的半径在0.25nm至6nm的范围内,并且盘状结构相对于膜表面平面以20°至160°之间的角度取向。

著录项

  • 公开/公告号US2008020175A1

    专利类型

  • 公开/公告日2008-01-24

    原文格式PDF

  • 申请/专利权人 FRED RATEL;

    申请/专利号US20070681685

  • 发明设计人 FRED RATEL;

    申请日2007-03-02

  • 分类号B32B5/12;B05D1/10;

  • 国家 US

  • 入库时间 2022-08-21 20:13:45

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