首页> 外国专利> COMPOSITION CONTAINING A PHOTOACID GENERATOR MONOMER, SUBSTRAT COATED WITH THE COMPOSITION, METHOD FOR SYNTHESIZING A COMPOUND ON A SUBSTRATE USING THE COMPOSITION, AND MICROARRAY PRODUCED ACCORDING TO THE METHOD

COMPOSITION CONTAINING A PHOTOACID GENERATOR MONOMER, SUBSTRAT COATED WITH THE COMPOSITION, METHOD FOR SYNTHESIZING A COMPOUND ON A SUBSTRATE USING THE COMPOSITION, AND MICROARRAY PRODUCED ACCORDING TO THE METHOD

机译:包含光酸生成单体的组合物,用该组合物进行底涂的基质,使用该组合物在基质上合成化合物的方法,以及根据该方法产生的微阵列

摘要

A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a solid substrate; coating a layer of the photoacid generator monomer composition according to the present invention on the layer of first molecules; exposing the composition layer to light and then heat-treating to remove the acid labile protecting group from the first molecules corresponding to the exposed portion; washing and removing the composition layer from the exposed and unexposed portions; and bonding second molecules to the exposed first molecules.
机译:提供了包含光酸产生剂单体和表面活性剂的组合物,以及使用该组合物在基板上合成化合物的方法。该方法包括将具有酸不稳定保护基的第一分子层结合到固体基质上;在第一分子层上涂覆根据本发明的光酸产生剂单体组合物的层;使组合物层曝光,然后进行热处理以从对应于暴露部分的第一分子中除去酸不稳定的保护基;从暴露的和未暴露的部分洗涤并除去组合物层;使第二分子与暴露的第一分子键合。

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