首页>
外国专利>
Elimination of write head plating defects using high activation chemically amplified resist
Elimination of write head plating defects using high activation chemically amplified resist
展开▼
机译:使用高活化化学放大抗蚀剂消除写入头电镀缺陷
展开▼
页面导航
摘要
著录项
相似文献
摘要
Methods of forming a component of a thin film magnetic head and improving the plating of a component of a thin film magnetic head are provided. The methods include the use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects. The methods find utility in hard disk drive applications, such as in the manufacture of magnetic poles for the write head of a hard disk drive.
展开▼