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Deposition Rate Plasma Enhanced Chemical Vapor Process
Deposition Rate Plasma Enhanced Chemical Vapor Process
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机译:沉积速率等离子体增强化学气相工艺
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摘要
A process for depositing a layer of a plasma polymerized organosiloxane, siloxane or silicon oxide onto the surface of an organic polymeric substrate by atmospheric pressure glow discharge deposition from a gaseous mixture comprising a silicon containing compound and an oxidant, characterized in that the oxidant comprises N2O.
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