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Sacrificial oxide layer which enables spacer over-etch in tri-gate architectures
Sacrificial oxide layer which enables spacer over-etch in tri-gate architectures
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机译:牺牲氧化物层,可在三栅架构中实现隔离层的过度蚀刻
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摘要
Embodiments of methods and apparatus for a sacrificial oxide layer which enables spacer over-etch in multi-gate architectures are generally described herein. Other embodiments may be described and claimed.
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