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Photomask registration errors of which have been corrected and method of correcting registration errors of photomask
Photomask registration errors of which have been corrected and method of correcting registration errors of photomask
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机译:已更正的光掩模配准错误和纠正光掩模配准错误的方法
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摘要
Provided are photomask registration errors of which have been corrected and a method of correcting the registration errors of a photomask. The photomask includes a photomask substrate, an optical pattern formed on one surface of the photomask substrate, and a plurality of stress generation portions formed in the photomask substrate. A method of correcting the registration errors of a photomask includes the steps of forming an optical pattern on a photomask substrate, measuring the registration errors of the optical pattern, and forming a plurality of stress generation portions in the photomask substrate so that the stress generation portions correspond to the measured registration errors.
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