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Formation of self-assembled monolayers of redox SAMs on silicon for molecular memory applications

机译:用于分子存储应用的硅上氧化还原SAM的自组装单层形成

摘要

This invention provides a new method of forming a self-assembling monolayer (SAM) of alcohol-terminated or thiol-terminated organic molecules (e.g. ferrocenes, porphyrins, etc.) on a silicon or other group IV element surface. The assembly is based on the formation of an E-O— or an E-S— bond where E is the group IV element (e.g. Si, Ge, etc.). The procedure has been successfully used on both P- and n-type group IV element surfaces. The assemblies are stable under ambient conditions and can be exposed to repeated electrochemical cycling.
机译:本发明提供了一种在硅或其他IV族元素表面上形成醇末端或硫醇末端的有机分子(例如二茂铁,卟啉等)的自组装单层(SAM)的新方法。该组装基于E-O-或ES-S-键的形成,其中E是IV族元素(例如Si,Ge等)。该方法已成功用于P型和n型IV组元素表面。该组件在环境条件下是稳定的,并且可以暴露于重复的电化学循环中。

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