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Device for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit

机译:用于避免由于集成电路的回填金属层中的工艺缺陷而导致的时序违规的装置

摘要

A method and firmware for avoiding timing violations resulting from process defects in a backfilled metal layer of an integrated circuit includes steps of receiving as input timing information for an integrated circuit design including at least one metal layer and a plurality of signal wires and dummy metal wires in the metal layer, finding at least one of a setup time and a hold time for each signal wire in the metal layer from the timing information, identifying a timing-critical signal wire from at least one of the setup time and the hold time for one of the signal wires that would produce a timing violation in the signal wire when the signal wire is shorted to a dummy metal wire by a process defect in the metal layer, calculating at least one of a wire width, a fracture interval, and a spacing for modifying the dummy metal wire to avoid the timing violation in the timing-critical signal wire, and generating as output at least one of the wire width and the fracture interval for the dummy metal wire.
机译:一种用于避免由于集成电路的回填金属层中的工艺缺陷而导致的时序违规的方法和固件,包括以下步骤:接收用于集成电路设计的时序信息作为输入,该集成电路设计包括至少一个金属层以及多条信号线和虚拟金属线。在金属层中,从时序信息中找到金属层中每条信号线的建立时间和保持时间中的至少一个,从建立时间和保持时间中的至少一个来识别时序关键信号线,以用于当信号线由于金属层中的工艺缺陷而与虚拟金属线短路时,将在信号线中产生时序冲突的信号线中的一根,计算出线宽,断裂间隔和用于修改虚拟金属线的间距,以避免时序关键信号线中的时序冲突,并为输出生成线宽和断裂间隔中的至少一个作为输出虚拟金属线。

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