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Structure of a coplanar gate-cathode of a triode CNT-FED and method of manufacturing same

机译:三极管CNT-FED的共面栅极-阴极的结构及其制造方法

摘要

A structure of a coplanar gate-cathode of triode CNT-FED and a manufacturing method thereof by Imprint Lithography and ink jet. The structure includes a substrate, a plurality of cathode layers, a plurality of gate extended layers, a plastic dielectric layer, a plurality of dielectric openings, and a plurality of gate electrodes. The plurality of cathode layers and the plurality of gate extended layers are coplanar, and formed on the substrate by Imprint Lithography and the plurality of dielectric openings are made by Imprint Lithography. The gate electrode, made by ink jet or screen print, can be extended through the plastic dielectric layer to the gate extended electrode to feature the coplanar gate-cathode.
机译:三极管CNT-FED的共面栅极-阴极的结构及其通过压印光刻和喷墨的制造方法。该结构包括衬底,多个阴极层,多个栅极延伸层,塑料介电层,多个介电开口和多个栅电极。多个阴极层和多个栅极延伸层是共面的,并且通过压印光刻法形成在基板上,并且多个电介质开口通过压印光刻法形成。通过喷墨或丝网印刷制成的栅电极可以延伸穿过塑料介电层,到达栅延伸电极,以形成共面栅阴极。

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