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A METHOD OF DIRECT BONDING TWO SUBSTRATES USED IN ELECTRONICS, OPTICS, OR OPTOELECTRONICS

机译:在电子,光学或光电子学中直接粘合两个基体的方法

摘要

A METHOD OF DIRECT BONDING TWO SUBSTRATES USED INELECTRONICS, OPTICS, OR OPTOELECTRONICS A B S T R A C TThe invention relates to a method of direct bonding the front faces (11, 21) of two substrates (1, 2) for use in electronics, optics, or optoelectronics, at least one of the substrates comprising a layer of semiconductormaterial (1, 13, 2, 20, 23) that extends over its front face (11, 21) or in the proximity thereof. The method is remarkable in that it comprises the following steps consisting in:• subjecting at least the front face (11, 21) of the substrate comprising a semiconductor or at least one of the front faces (11, 21) of the two substrates if both substrates comprise a semiconductor, to preparation heat treatment prior to bonding, at a temperature lying in the range 900°C to 1200°C, in a gaseous atmosphere comprisinghydrogen and/or argon, and for a duration of at least 30 s; and• bonding directly together said respective front faces (11, 21) of the two substrates (1, 2) for bonding together.Fig. 1A
机译:直接结合使用两个基体的方法电子,光学或光电子 A B S T R A C T本发明涉及直接结合的方法要使用的两个基板(1、2)的正面(11、21)在电子,光学或光电子学领域,至少一项包括一层半导体的衬底在其正面延伸的材料(1、13、2、20、23)面(11、21)或其附近。方法是值得注意的是,它包括以下步骤包括:•至少使眼镜的正面(11,21)衬底,其包含半导体或以下至少之一如果两个基板的正面(11,21)基板包含半导体以准备加热粘接前的处理,温度在温度范围为900°C至1200°C,氢气和/或氩气,持续时间至少30秒;和•直接粘接在一起,说各自的前面两个基板(1、2)的粘合面(11、21)一起。图1A

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