首页> 外国专利> METHOD FOR UTILIZING HEAVILY DOPED SILICON FEEDSTOCK TO PRODUCE SUBSTRATES FOR PHOTOVOLTAIC APPLICATIONS BY DOPANT COMPENSATION DURING CRYSTAL GROWTH

METHOD FOR UTILIZING HEAVILY DOPED SILICON FEEDSTOCK TO PRODUCE SUBSTRATES FOR PHOTOVOLTAIC APPLICATIONS BY DOPANT COMPENSATION DURING CRYSTAL GROWTH

机译:在晶体生长过程中利用掺杂剂补偿利用重掺杂硅原料生产光伏应用基质的方法

摘要

A method for using relatively low-cost silicon with low metal impurity concentration by adding a measured amount of dopant and or dopants before and/or during silicon crystal growth so as to nearly balance, or compensate, the p-type and n-type dopants in the crystal, thereby controlling the net doping concentration within an acceptable range for manufacturing high efficiency solar cells.
机译:一种通过在硅晶体生长之前和/或期间添加一定量的掺杂剂和/或掺杂剂,以使p型和n型掺杂剂几乎平衡或补偿的方式,使用具有较低金属杂质浓度的相对低成本的硅的方法晶体中的杂质,从而将净掺杂浓度控制在制造高效太阳能电池的可接受范围内。

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