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LITHOGRAPHICALLY PATTERNED NANOWIRE ELECTRODEPOSITION

机译:光刻图案的纳米电沉积

摘要

Lithographically patterned nanowire electrodeposition (LPNE) combines attributes of photolithography with the versatility of bottom-up electrochemical synthesis. Photolithography is employed to define the position of a sacrificial nanoband electrode, preferably formed from a metal such as nickel, copper, silver, gold or the like, which is stripped using electrooxidation or a chemical etchant to advantageously recess the nanoband electrode between a substrate surface and the photoresist to form a trench defined by the substrate surface, the photoresist and the nanoband electrode. The trench acts as a "nanoform" to form an incipient nanowire during its electrodeposition. The width of the nanowire is determined by the electrodeposition duration while its height is determined by the height of the nanobanc electrode.
机译:光刻图案化的纳米线电沉积(LPNE)结合了光刻技术和自下而上的电化学合成的多功能性。使用光刻法来限定牺牲纳米带电极的位置,该牺牲纳米带电极优选地由诸如镍,铜,银,金等的金属形成,使用电氧化或化学蚀刻剂将其剥离以有利地使纳米带电极凹入衬底表面之间。所述光致抗蚀剂形成由所述衬底表面,所述光致抗蚀剂和所述纳米带电极限定的沟槽。沟槽在其电沉积过程中充当“纳米形”以形成初始纳米线。纳米线的宽度由电沉积持续时间确定,而其高度由纳米层电极的高度确定。

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