PARTICLE TRAP / FILTER FOR RECIRCULATING A DILUTION GAS IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

摘要

The present invention comprises a method and an apparatus that include a particle trap/filter for recirculating a processing gas through a system. The processing gas may be evacuated from the chamber and may pass through a particle trap/filter. A portion of the gas may recirculate back to the processing chamber while another portion of the process gas may be evacuated through mechanical backing pumps. As the processing gas flows through the particle trap/filter, contaminant substances may be captured by a filter medium inside the particle trap/filter. The recirculated portion of the processing gas may then join fresh, unrecirculated process gas and enter the processing chamber. The amount of gas recirculated may determine the amount of fresh, unrecirculated process gas that may be delivered to the process chamber.