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Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications

机译：通过等离子增强化学气相沉积法（由SiH4，CH4，NH3和B2H6气体混合物产生）产生的超细颗粒，用于纳米结构陶瓷应用

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Bertrán Serra Enric; Costa i Balanzat Josep; Viera Mármol Gregorio; Andújar Bella José Luis; Canillas i Biosca Adolf; Pascual Miralles Esther;
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年度 1999
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1. Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition [J] . Suyean Kim, Byungwhan Kim Metals and Materials International . 2009,第5期

机译：射频偏压对等离子体增强化学气相沉积法沉积在SiH4 -NH3 中的氮化硅膜的影响
2. Properties of SixNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using SiH4/NH3/Ar as diffusion barrier film [J] . Pham TTT, Lee JH, Kim YS, Surface & Coatings Technology . 2008,第22a23期

机译：以SiH4 / NH3 / Ar为扩散阻挡膜的低温等离子体增强化学气相沉积法沉积SixNy薄膜的性能
3. Simulation of gas-phase nanoparticle dynamics in the plasma-enhanced chemical vapor deposition of carbon nanostructures [J] . Rutkevych PP, Ostrikov K, Denysenko IB, Physica Scripta: An International Journal for Experimental and Theoretical Physics . 2004,第5期

机译：碳纳米结构的等离子体化学气相沉积中气相纳米颗粒动力学的模拟
4. Thermal stabilization and crystallization of nanometric particles of Si-C-N produced by RF-plasma enhanced chemical-vapor-deposition [C] . Gregorio Viera, Enric Bertran, Mari C. Polo, Materials Research Society Symposium . 2001

机译：RF - 血浆增强化学蒸汽沉积产生的Si-C-N纳米粒子的热稳定和结晶
5. Lattice matched III-V/group IV semiconductor heterostructures: Metalorganic chemical vapor deposition and remote plasma-enhanced chemical vapor deposition. [D] . Choi, Sungwoo. 1992

机译：晶格匹配的III-V / IV组半导体异质结构：金属有机化学气相沉积和远程等离子体增强化学气相沉积。
6. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
7. Metal/Carbon Hybrid Nanostructures Produced from Plasma-Enhanced Chemical Vapor Deposition over Nafion-Supported Electrochemically Deposited Cobalt Nanoparticles [O] . Mohammad Islam, Amine Achour, Khalid Saeed, 2018

机译：从等离子体增强的化学气相沉积在Nafion-Hasted的电化学沉积的钴纳米粒子中产生的金属/碳杂合纳米结构

Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications

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