THE APPLICATION OF NON-IONIC POLYMERS IN PRODUCTION OF POLISHING LIQUID OF SELF-ETCH-STOP OF POLYSILICON AND USAGE OF THE SAME

摘要

The present invention discloses the application of polymers which comprise repeating units containing -(RO)- or -(RCOO)- groups in production of chemical mechanical polishing liquid of self-etch-stop of polysilicon and usage of the same, in which R is alkyl of C1-10. The polymers of the invention are used in production of polishing liquid and usage of the same, it can realize the process of self-etch-stop mechanism in chemical mechanical polishing of polysilicon under polishing conditions of constant conventional technical parameter, so as to prevent silicon dioxide channels from generating dishing defects of polysilicon, and to remove residual polysilicon from the silicon dioxide dishing defects and improve surface flatness of the polished wafers. Furthermore it has wide technology window, which can greatly improve the productivity and lower the cost.