POINT ARRAY EVAPORATOR FOR VAPOR DEPOSITION OF THIN FILM

摘要

A point array evaporation source for depositing a thin film is provided to form a uniform deposition layer on a large-area substrate by adjusting the evaporation height of point evaporation sources disposed in a line. The upper surface of a crucible(32) is open wherein a deposition material(20) is contained in the crucible. Point evaporation sources(30) including a heating apparatus(34) for heating the crucible are disposed in a line. Point array evaporation sources for depositing a thin film are disposed in a manner that deposition materials are spread from the point evaporation source at different heights. The height of the deposition material spreading from the point evaporation source increases as it goes from the center of the disposition of the point evaporation source to the outside.