首页> 外国专利> METHOD OF GROWING GAN LAYER FOR MANUFACTURING LIGHT EMITTING DIODE HAVING ENHANCED LIGHT EXTRACTION CHARACTERISTICS, METHOD OF MANUFACTURING LIGHT EMITTING DIODE USING THE SAME, AND LIGHT EMITTING DIODE DEVICE THEREOF

METHOD OF GROWING GAN LAYER FOR MANUFACTURING LIGHT EMITTING DIODE HAVING ENHANCED LIGHT EXTRACTION CHARACTERISTICS, METHOD OF MANUFACTURING LIGHT EMITTING DIODE USING THE SAME, AND LIGHT EMITTING DIODE DEVICE THEREOF

机译:具有增强的光提取特性的制造发光二极管的gan层的生长方法,使用相同的发光二极管的制造方法及其发光二极管装置

摘要

A method of forming a GaN layer for manufacturing an LED having enhanced light extraction characteristics, a method of manufacturing the LED using the same, and the LED manufactured by the same are provided to increase a light extraction area by forming the GaN layer using a nature preference growth characteristic of a GaN crystal. A GaN thin film(20) is formed on a substrate(10). An insulating layer pattern(30) defining a hexagon opening pattern(40) for exposing the upper surface of the GaN thin film is formed, so that a direction of lines connecting cusp points of the hexagon can make 30 degrees angle with a nature preference characteristic direction. A GaN layer(50) is grown selectively on the GaN thin film exposed by the hexagon using the insulating layer pattern as a mask.
机译:提供一种形成用于制造具有增强的光提取特性的LED的GaN层的方法,一种使用其制造LED的方法以及由其制造的LED,以通过利用自然形成GaN层来增加光提取面积。 GaN晶体的优先生长特性。在衬底(10)上形成GaN薄膜(20)。形成绝缘层图案(30),该绝缘层图案(30)限定用于暴露GaN薄膜的上表面的六边形开口图案(40),使得连接六边形的尖端的线的方向可以形成具有自然偏好特性的30度角。方向。使用绝缘层图案作为掩模,在通过六边形暴露的GaN薄膜上选择性地生长GaN层(50)。

著录项

  • 公开/公告号KR20080057906A

    专利类型

  • 公开/公告日2008-06-25

    原文格式PDF

  • 申请/专利权人 SILTRON INC.;

    申请/专利号KR20060131803

  • 申请日2006-12-21

  • 分类号H01L33;

  • 国家 KR

  • 入库时间 2022-08-21 19:53:27

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号