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FLAT LIGHT SOURCE MINIMIZED FRAUNHOFER DIFFRACTION

机译:平板光源最小化的夫兰霍夫衍射

摘要

Disclosed is a flat light source in which intensity of light emitted from sub-pixels is adjusted using color density distribution or color thickness distribution of a sub-pixel provided in the flat light source to minimize Fraunhofer diffraction. The flat light source is configured as such that an auxiliary flat light source has a color density distribution different from that of the sub-pixel and is inserted into the sub-pixel to constitute a pixel of a flat light source, such that intensity of light emitted from the auxiliary flat light source is stronger than intensity of light emitted from the sub-pixel in order to minimize intensity of light of second or higher order Fraunhofer diffraction patterns caused by the flat light source. Cleaner image is formed and a minute image can be realized.
机译:公开了一种平面光源,其中,使用设置在平面光源中的子像素的颜色密度分布或颜色厚度分布来调整从子像素发射的光的强度,以最小化弗劳恩霍夫衍射。平面光源被配置为使得辅助平面光源具有与子像素不同的颜色密度分布,并且被插入到子像素中以构成平面光源的像素,使得光强度从辅助平面光源发出的光的强度比从子像素发出的光的强度要强,以便最小化由平面光源引起的二阶或更高阶弗劳恩霍夫衍射图案的光的强度。形成较清晰的图像,可以实现精细的图像。

著录项

  • 公开/公告号KR100799405B1

    专利类型

  • 公开/公告日2008-01-30

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20070009229

  • 发明设计人 박상업;

    申请日2007-01-30

  • 分类号G02F1/01;F21V1;G02B27/42;F21V8;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:35

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