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COIL HAVING VARIABLE RF COUPLING, PLASMA PROCESSOR WITH THE SAME, AND METHOD OF CONTROLLING RF PLASMA USING THE SAME
COIL HAVING VARIABLE RF COUPLING, PLASMA PROCESSOR WITH THE SAME, AND METHOD OF CONTROLLING RF PLASMA USING THE SAME
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机译:具有可变射频耦合的线圈,具有该射频线圈的等离子体处理器以及使用该射频线圈控制等离子体的方法
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摘要
A coil for exciting an r.f. plasma in a vacuum plasma processing chamber includes plural radially and circumferentially extending turns connected between a pair of r.f. excitation terminals. In one embodiment, a drive mechanism varies r.f. field coupling coefficients between different radial and circumferential portions of the coil and the plasma. The drive mechanism includes plural drive shafts which drive different portions of the coil toward and away from the plasma. In a second embodiment, the drive mechanism drives an r.f. shield having at least one moving part for intercepting a portion of an r.f. plasma excitation field derived by the coil.
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