ON-LINE DIAGNOSTICS OF PLASMA SURFACE INTERACTIONS (PSI) IN DEPOSITION PROCESSES OF CARBIDES AND PEROVSKITES IN LOW PRESSURE INDUCTIVELY COUPLED RF PLASMAS (IRF).

摘要

Quadrupole mass spectrometry (QMS), laser induced fluorescence (LEF) and optical emission spectrometry (OES) were used for the on-line diagnostics of plasma-suface-interactions (PSI) during deposition of carbides (a:B:C:H and Si C) and perovskite (La Mn 0 3) thin films. The monomers used in the plasma deposition processes were B Cl 3 and Si Cl 4 in the Ar + CH4 + H2gas mixtures for a:B:C:H and Si C while nitrate aqueous solutions of La and Mn in Ar+O 2 gas mixtures for La Mn 0 3. The deposited thin films with a thicknen of about 0.1 urn were exposed to Ar+H 2 (reducing) and Ar+O 2 (oxidizing) IRF plasmas. The PSI diagnostics at 10"4 m from the substale surfaces indicate the deposition, sputtering and etching phenomena coexist in the same process.