PLASMA PROCESSOR WITH COIL HAVING VARIABLE RF COUPLING

摘要

Coil for the rf plasma in a vacuum plasma processing chambers herein, it comprises a line which extends circumferentially in a plurality of radially connected between a pair of rf terminal here. In one example, the actuator mechanism is thereby changing the rf field coupling coefficients between different radial portions of the circumference of the coil and the plasma. The actuator mechanism includes a plurality of driver shafts for driving different portions of the coil toward the plasma and from far. Claim in the second embodiment, the actuator mechanism drives the rf shield having at least one moving part of the sheet to block the rf plasma excitation portion drawn by the coil. ; rf plasma, actuators, mechanisms, plasma