首页> 外国专利> METHOD FOR MANUFACTURING SELF-ALIGNED RIDGE WAVEGUIDE SEMICONDUCTOR LASER DIODE AND OPTICAL MODE CONVERTER USING PROTECTION LAYER

METHOD FOR MANUFACTURING SELF-ALIGNED RIDGE WAVEGUIDE SEMICONDUCTOR LASER DIODE AND OPTICAL MODE CONVERTER USING PROTECTION LAYER

机译:利用保护层制造自对准脊波波导半导体激光二极管的方法和光模转换器

摘要

A method for manufacturing a self-aligned ridge waveguide semiconductor laser diode and an optical mode converter using a protection layer is provided to form a protection layer by coating material based polymer without performing additionally photolithography process to easily implement a p-side ohmic contact. A method for manufacturing a self-aligned ridge waveguide semiconductor laser diode and an optical mode converter using a protection layer includes a step of forming a basic structure of a semiconductor laser diode by sequentially depositing a bottom clad layer(110), an active layer(120), an top clad layer(130), and an ohmic contact layer(140) on a semiconductor substrate(100). A ridge waveguide is formed by sequentially etching the ohmic contact layer and the top clad layer with a mask pattern for the active layer to be exposed. A protection layer(150) is formed on a top surface of the ridge waveguide. The ohmic contact layer is exposed by using a dry etching manner.
机译:提供一种用于制造自对准脊形波导半导体激光二极管的方法和使用保护层的光学模式转换器,以通过涂覆基于材料的聚合物来形成保护层,而无需执行额外的光刻工艺来容易地实现p侧欧姆接触。一种使用保护层的自对准脊形波导半导体激光二极管的制造方法和光模式转换器,包括通过依次沉积底部覆盖层(110),有源层(110)形成半导体激光二极管的基本结构的步骤。 120),顶部覆盖层(130)和半导体衬底(100)上的欧姆接触层(140)。通过依次蚀刻具有用于暴露有源层的掩模图案的欧姆接触层和上覆层来形成脊形波导。在脊形波导的顶表面上形成保护层(150)。通过使用干蚀刻的方式暴露欧姆接触层。

著录项

  • 公开/公告号KR100821364B1

    专利类型

  • 公开/公告日2008-04-11

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060096194

  • 发明设计人 이승열;이용탁;

    申请日2006-09-29

  • 分类号H01S3/0941;H01S5;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:13

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