PHOTO REGISTER EXCLUSION EQUIPMENT FOR PHOTO REGISTER EXCLUSION METHOD AND LIQUID CRYSTAL DISPLAY SUBSTRATE PHOTO REGISTER EXCLUSION EQUIPMENT

摘要

Photoresist stripping equipment of an LCD substrate and a photoresist stripping method using the same are provided to form a thin water boundary layer on the LCD substrate by using gas where high density ozone gas and vapor are mixed, and strip the photoresist with high efficiency by using high oxidation power of the ozone. A photoresist stripping method comprises the following steps of: transferring an LCD(Liquid Crystal Display) substrate into a stripping process chamber(S10); heating the LCD substrate by spraying high temperature water to a lower side of the LCD substrate(S20); stripping a photoresist by spraying photoresist stripping gas from a gas spray nozzle installed in an upper side of the heated LCD substrate(S30); stripping a photoresist by reciprocating the LCD substrate left and right by using a transfer roller(S40); transferring the LCD substrate to a cleaning process chamber, and cleaning the LCD substrate by spraying cleaning water by using a cleaning water spray nozzle(S50); removing moisture as passing the cleaned LCD substrate through an air knife, re-transferring the LCD substrate to the stripping process chamber, and repeating the above third to fifth steps several times(S60); and cleaning the LCD substrate in the cleaning process chamber, removing moisture by passing the LCD substrate through an air knife of the other side, and discharging the LCD substrate through a discharge path(S70).