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A SELF-CLEANING OPTIC FOR EXTREME ULTRAVIOLET LITHOGRAPHY
A SELF-CLEANING OPTIC FOR EXTREME ULTRAVIOLET LITHOGRAPHY
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机译:一种用于极端紫外光刻的自清洁光学系统
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摘要
A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O2, H2, H2O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.
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