首页> 外国专利> SPIN HEAD AND METHOD FOR CHUCKING/UNCHUKING SUBSTRATE USING THE SPIN HEAD, AND APPARATUS FOR TREATING SUBSTRATE WITH THE SPIN HEAD

SPIN HEAD AND METHOD FOR CHUCKING/UNCHUKING SUBSTRATE USING THE SPIN HEAD, AND APPARATUS FOR TREATING SUBSTRATE WITH THE SPIN HEAD

机译:旋转头和使用旋转头的卡盘/松开基质的方法,以及用旋转头对基质进行处理的装置

摘要

the present invention is a process when the supporting substrate and spinning the spin head and spin the head of the wafer chuck / unloading chucking method , and that having the spin head and to an apparatus for performing a process for processing a substrate , according to the present invention , the part that contacts the kingpin chucking and unloading the chuck to perform chucking the substrate and the substrate to perform a process while the change to ensure that , chuck kingpin and the treatment liquid on the substrate is to prevent the portion contacting the remaining developer .
机译:本发明是当支撑衬底并旋转晶片吸盘/卸载吸盘法的旋转头和旋转头时的工艺,以及具有该旋转头的装置和用于进行衬底加工的设备。在本发明中,接触主销的部分夹紧并卸下卡盘以执行对基板的夹紧,并且在进行处理的同时进行改变以确保卡盘主销和基板上的处理液是防止与剩余部分接触的部分开发商。

著录项

  • 公开/公告号KR100865941B1

    专利类型

  • 公开/公告日2008-10-30

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060118076

  • 申请日2006-11-28

  • 分类号H01L21/687;H01L21/683;H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 19:51:33

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