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A nonvolatile semiconductor - memory cell, nonvolatile semiconductor memory - component and a method for producing a non-volatile semiconductor memory - component

机译:非易失性半导体存储单元,非易失性半导体存储器组件以及制造非易失性半导体存储器组件的方法

摘要

A nonvolatile semiconductor - memory cell, comprising:– a semiconductor substrate (31) of the first conductivity type;– a common source region (32a) of the second conductivity type in a first direction within the substrate (31);– a first drain region (32b) and a second drain region (32b) of the second conductivity type in the first direction in the substrate (31) with a fixed distance from both sides of the common source region (32a);– an insulating film (38a, 39) on the substrate (31);– an insulating strip (40b) on said insulating film (38a, 39) both via the common source region (32a) as well as at one side of the common source region (32a), the second drain region (32b) lying closest to; a conductive potential unsaturated collar a gate (35a, 35b) over said insulating film (38a, 39) and the insulating strips (40b),– a dielectric film (36) on the exposed surfaces of the floating gates (35a, 35b), and– a conductive control gate (37) in a second direction on the dielectric..
机译:一种非易失性半导体存储单元,包括:-第一导电类型的半导体衬底(31);-衬底(31)内沿第一方向的第二导电类型的公共源极区(32a);-第一漏极衬底(31)中沿第一方向具有第二导电类型的第二导电区域(32b)和第二漏极区域(32b),与公共源极区域(32a)的两侧保持固定距离; –绝缘膜(38a, 39);-在所述绝缘膜(38a,39)上的绝缘带(40b)既通过公共源极区域(32a)也在公共源极区域(32a)的一侧通过,最靠近第二漏极区(32b);导电电位不饱和环,在所述绝缘膜(38a,39)和绝缘条(40b)上的栅极(35a,35b),-浮栅(35a,35b)暴露表面上的介电膜(36), –电介质上第二方向的导电控制栅(37)。

著录项

  • 公开/公告号DE19822523B4

    专利类型

  • 公开/公告日2008-03-13

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE1998122523

  • 发明设计人

    申请日1998-05-19

  • 分类号H01L27/115;H01L21/8247;

  • 国家 DE

  • 入库时间 2022-08-21 19:50:17

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