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Organic antireflective coating polymers, antireflective coating compositions comprising such polymers, and methods of making the same
Organic antireflective coating polymers, antireflective coating compositions comprising such polymers, and methods of making the same
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机译:有机抗反射涂料聚合物,包含这种聚合物的抗反射涂料组合物及其制备方法
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摘要
Organic anti-reflective polymer is a compound of formula (1) and is useful for fabricating ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices since it eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist. Organic anti-reflective polymer is a compound of formula (1): [Image] R a- R chydrogen or methyl; R a- R d, and R 1- R 9-H, -OH, -OCOCH 3, -COOH, -CH 2OH, or substituted or unsubstituted, or straight or branched alkyl or alkoxy alkyl having 1 - 5 C; l, m and n : an integer selected from 1, 2, 3, 4 and 5; and x, y, and z : mole fraction from 0.01 - 0.99. Independent claims are also included for: (A) an anti-reflective coating composition comprising a compound (1) and a compound of formula (2); and (B) a method for preparing an anti-reflective coating comprises: (i) dissolving compound (1) and compound (2) in an organic solvent; (ii) filtering the obtained solution alone or in combination with an anthracene derivative; (iii) coating the filtrate on a lower layer; and (iv) hard-baking the coated layer. [Image] R 10- R 11straight or branched substituted 1 - 10C alkoxy; and R 12hydrogen or methyl.
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机译:有机抗反射聚合物是式(1)的化合物,可用于制造64M,256M,1G和4G DRAM半导体器件的超精细图案,因为它消除了由晶片上下层的光学特性和光刻胶的厚度变化。有机抗反射聚合物是式(1)的化合物:[R a] -R c>氢或甲基; R a-R d和R 1 -R 9-H,-OH,-OCOCH 3,-COOH,-CH 2OH或具有1-5个碳原子的取代或未取代的,或直链或支链的烷基或烷氧基烷基; l,m和n:选自1、2、3、4和5的整数;和x,y和z:0.01至0.99的摩尔分数。还包括以下独立权利要求:(A)抗反射涂料组合物,其包含化合物(1)和式(2)的化合物;以及(B)防反射膜的制备方法,其包括:(i)将化合物(1)和化合物(2)溶解在有机溶剂中;以及(ii)单独过滤或与蒽衍生物组合过滤得到的溶液; (iii)将滤液涂覆在下层上; (iv)将涂层硬烘烤。 [图像] R 10- R 11直链或支链取代的1-10C烷氧基; R 12为氢或甲基。
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