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positivresist composition and method for formation of resistmustern by using the same

机译:正抗蚀剂组合物和使用该组合物形成抗蚀剂的方法

摘要

A positive resist - a composition comprising:a resin - component (a), which is under the action of acid an increased solubility in alkali, wherein said resin - component (a) comprises a copolymer (a1), which contains:(i) a structural unit (a1), which is covered by an acrylic acid esters or methacrylic acid esters is derived and one acid cleavable, the resolution of preventing group, wherein the structural unit (a1) at least one of a shown at the bottom of general formula (i) or a general formula (ii) is selected entity: in which r is a hydrogen atom or a methyl group and r1 an alkyl group having 2 to 5 carbon atoms, and in which r is a hydrogen atom or a methyl group and r2 and r3 in each case independently of one another is an alkyl group having 1 to 5 carbon atoms, ..
机译:正抗蚀剂-包含:树脂-组分(a)的组合物,其在酸的作用下在碱中的溶解度增加,其中所述树脂-组分(a)包含共聚物(a1),该共聚物包含:(i)衍生出由丙烯酸酯或甲基丙烯酸酯覆盖的结构单元(a1),并且可裂解一种酸,防止基团的拆分,其中结构单元(a1)的至少一个如下所示。选择式(i)或通式(ii)的实体:其中r是氢原子或甲基,并且r 1 是具有2至5个碳原子的烷基,并且其中r是一个氢原子或一个甲基,并且r 2 和r 3 在每种情况下彼此独立地是具有1-5个碳原子的烷基,..

著录项

  • 公开/公告号DE112004001155T8

    专利类型

  • 公开/公告日2008-08-28

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE112004001155T8

  • 发明设计人

    申请日2004-06-28

  • 分类号G03F7/039;G03F7/38;

  • 国家 DE

  • 入库时间 2022-08-21 19:50:02

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