Film formation composition, resist composition, radiation-sensitive composition, amorphous film production method, resist pattern formation method, lithography underlayer film formation composition, lithography underlayer film production method and circuit pattern formation method

摘要

A polycyclic polyphenol resin having a repeating unit derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by formulas (1A) and (1B), wherein the repeating units are directly between aromatic rings. A film-forming composition comprising a polycyclic polyphenol resin connected by bonds. [Formula 1] (In formula (1A), X represents an oxygen atom, a sulfur atom, a single bond, or unbridged, Y is a 2n-valent group or single bond having 1 to 60 carbon atoms, wherein, when X is unbridged, Y is the 2n-valent In the formula (1B), A represents a benzene ring or a condensed ring.Furthermore, in the formula (1A) and (1B), R 0 each independently represents 1 to optionally having a substituent. 40 alkyl group, optionally substituted aryl group having 6 to 40 carbon atoms, optionally substituted alkenyl group having 2 to 40 carbon atoms, alkynyl group having 2 to 40 carbon atoms, optionally having 1 to 40 carbon atoms of an alkoxy group, a halogen atom, a thiol group or a hydroxyl group, where R 0At least one is a hydroxyl group, and m is each independently an integer of 1-9. n is an integer from 1 to 4, and p is each independently an integer from 0 to 3.)