首页> 外国专利> Method for manufacturing of microstructure component, involves forming of material layer and another material layer by part of substrate, which is formed for manufacturing of microstructure component

Method for manufacturing of microstructure component, involves forming of material layer and another material layer by part of substrate, which is formed for manufacturing of microstructure component

机译:用于制造微结构部件的方法,涉及通过形成用于制造微结构部件的基板的一部分来形成材料层和另一材料层。

摘要

The method involves forming of a material layer (104) and another material layer by a part of the substrate (101), which is formed for manufacturing of microstructure component (100). The former material layer formed by a conductive latter material layer (102) is optically probed. The tensioning characteristic of former material layer and latter material layer is estimated on the basis of an optical response, which is caused by the optical probing of former material layer. The latter layer consists of a semiconductor material. An independent claim is also included for a measuring system for estimating tensioning characteristics of microstructure components.
机译:该方法包括通过衬底(101)的一部分形成材料层(104)和另一材料层,该衬底被形成用于制造微结构部件(100)。由导电的后一个材料层(102)形成的前一个材料层被光学探测。前材料层和后材料层的张紧特性是根据光学响应估算的,该响应是由前材料层的光学探测引起的。后一层由半导体材料组成。还包括用于估计微结构部件的张紧特性的测量系统的独立权利要求。

著录项

  • 公开/公告号DE102006062036A1

    专利类型

  • 公开/公告日2008-07-03

    原文格式PDF

  • 申请/专利权人 ADVANCED MICRO DEVICES INC.;

    申请/专利号DE20061062036

  • 发明设计人 WIRBELEIT FRANK;

    申请日2006-12-29

  • 分类号H01L21/66;G01N21/17;G01N21/63;

  • 国家 DE

  • 入库时间 2022-08-21 19:49:33

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