Device and memory device, method for producing structures in a workpiece and method for producing a memory device

摘要

One method of fabricating structures in a workpiece includes providing a region of a cap layer over a predetermined region of the workpiece, providing a resist layer over the workpiece and the cap layer, and forming resist patterns in the resist layer. The workpiece is patterned using the patterned resist layer and the cap layer as an etch mask. Another method of fabricating structures in a workpiece includes providing a resist layer over the workpiece and forming resist patterns in the resist layer. The workpiece is patterned using the patterned resist layer as an etch mask and obtaining workpiece structures. The workpiece structures are removed from a predetermined area of the workpiece. After that, a pitch fragmentation process is executed.