MASK FOR TRANSFERRING CIRCUIT PATTERN, METHOD FOR FORMING MASK PATTERN, PROGRAM FOR FORMING MASK PATTERN, MASK PATTERN FORMING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND APPARATUS FOR MANUFACTURING THE SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a mask for transferring a circuit pattern, the mask being capable of suppressing growth of haze.;SOLUTION: The mask includes one or a plurality of main patterns 11 and one or a plurality of dummy patterns 12 on the surface of a transparent substrate 10 that is transparent to light from a light source. The main pattern 11 is resolved onto a transfer object, when it is irradiated with the light from the light source. The dummy pattern 12 is formed in a region which is non-facing the main pattern 11, on the surface of the transparent substrate 10 and which does not resolve to the transfer object, when irradiated with the light from the light source.;COPYRIGHT: (C)2009,JPO&INPIT