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METHOD FOR ADJUSTING LIGHT QUANTITY OF PROJECTION SYSTEM, PROJECTION SYSTEM AND PROJECTOR

机译:投影系统的光量调整方法,投影系统及投影仪

摘要

PROBLEM TO BE SOLVED: To provide a method for adjusting a light quantity of a projection system, a projection system and a projector.;SOLUTION: In the method for adjusting the light quantity of the projection system in which a light quantity in an overlapping area is adjusted: a first procedure S2 for setting a plurality of light quantity decay curves from an inside end to an outside end in the overlapping area in a projection image by the projector; a second procedure S3 for simultaneously displaying a display image in accordance with each of the light quantity decay curves in the overlapping area; a third procedure S5 for selecting the display image that is most excellently displayed from a plurality of display images displayed simultaneously; and a fourth procedure S2 for setting a plurality of different light quantity decay curves again on the basis of the light quantity decay curve related to the selected display image are performed. By recursively repeating the first to fourth procedure S2, S3 and S5, the optimum light quantity decay curve is selected.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种用于调整投影系统的光量的方法,投影系统和投影仪。解决方案:在用于调整投影系统的光量的方法中,其中重叠区域中的光量调整:第一程序S2,用于由投影仪在投影图像的重叠区域中设置从内端到外端的多个光通量衰减曲线;第二步骤S3,用于根据重叠区域中的每一个光量衰减曲线同时显示显示图像;第三过程S5,用于从同时显示的多个显示图像中选择最出色显示的显示图像;执行第四过程S2,该第四过程S2基于与所选择的显示图像有关的光量衰减曲线来再次设置多个不同的光量衰减曲线。通过递归地重复第一至第四过程S2,S3和S5,选择最佳光量衰减曲线。;版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2009237051A

    专利类型

  • 公开/公告日2009-10-15

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20080080294

  • 发明设计人 FUJIMORI TOSHIKI;

    申请日2008-03-26

  • 分类号G03B21/00;H04N5/74;

  • 国家 JP

  • 入库时间 2022-08-21 19:46:08

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