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EVALUATION METHOD OF HYDROPHOBIC PROPERTY, HMDS PROCESSING SUBSTRATE, EVALUATION SYSTEM OF HYDROPHOBIC PROPERTY, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS
EVALUATION METHOD OF HYDROPHOBIC PROPERTY, HMDS PROCESSING SUBSTRATE, EVALUATION SYSTEM OF HYDROPHOBIC PROPERTY, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS
PROBLEM TO BE SOLVED: To solve a problem, in the case of obtaining hydrophobic property of a substrate surface using HMDS, that if PDMS (polydimethylsiloxane) exits as a contaminant, a large amount of ions of masses 73 ((CH3)3Si+) and 89 ((CH3)3SiO-) is generated by such PDMS and this PDMS is used as a separator of various injection mold type plastics and therefore exists in a winder range, but such amount of ions is insufficient as a monitor signal showing the state of hydrophobic property at the surface of substrate and such monitor signal results in a large error as the signal reflecting the state of hydrophobic property.;SOLUTION: In the evaluation method of hydrophobic property, amount of PDMS is measured, influence on the hydrophobic group element and influence on hydrophilic group element because of contamination by PDMS measured previously are subtracted from such measured amount of PDMS and thereafter a value obtained by dividing a signal of the hydrophobic group element with a signal of the hydrophilic group is used as an evaluation index to evaluate the hydrophobic property. Since hydrophobic property is obtained by compensating for an error with contamination by PDMS, high precision evaluation index for hydrophobic property can be calculated.;COPYRIGHT: (C)2009,JPO&INPIT
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