ELECTRON BEAM PLOTTING METHOD, FINE PATTERN PLOTTING SYSTEM, UNEVENNESS PATTERN CARRIER, AND MAGNETIC DISK MEDIUM

摘要

PPROBLEM TO BE SOLVED: To attain plotting with high accuracy and at high speed with fixed exposure on the substrate as a whole, by further enhancing the flexibility in exposure adjustment in scanning and plotting a fine pattern formed on a magnetic disk medium by electron beams, and plotting the complicated shape of the fine pattern with high accuracy. PSOLUTION: When the substrate 10 with a resist 11 applied thereto is scanned with the electron beams EB to plot elements 13 of the fine pattern 12, the elements are sequentially plotted by carrying out scanning control so that the electron beams EB are made to reciprocate and vibrate at high speed, in a direction Y orthogonal to a circumferential direction, and are deflected in a direction X which is orthogonal to the radial direction, at a higher speed than the rotating speed of a rotating stage 41 and plot the shapes of the elements. PCOPYRIGHT: (C)2009,JPO&INPIT