首页> 外国专利> QUANTUM WELL STRUCTURE, OPTICAL CONFINEMENT TYPE QUANTUM WELL STRUCTURE, SEMICONDUCTOR LASER, DISTRIBUTED FEEDBACK SEMICONDUCTOR LASER, SPECTROGRAPH, AND MANUFACTURING METHOD OF THE QUANTUM WELL STRUCTURE

QUANTUM WELL STRUCTURE, OPTICAL CONFINEMENT TYPE QUANTUM WELL STRUCTURE, SEMICONDUCTOR LASER, DISTRIBUTED FEEDBACK SEMICONDUCTOR LASER, SPECTROGRAPH, AND MANUFACTURING METHOD OF THE QUANTUM WELL STRUCTURE

机译:量子阱结构,光学约束型量子阱结构,半导体激光器,分布式反馈半导体激光器,光谱图和量子阱结构的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a quantum well structure capable of improving performance of characteristics to obtain the quantum well structure having a crystal with a large In composition thicker than conventional ones as a quantum well layer, an optical confinement type quantum well structure, semiconductor laser, distributed feedback semiconductor laser, a spectrograph and a manufacturing method of the quantum well structure.;SOLUTION: In the quantum well structure formed by an organic metal vapor growth method on an InP substrate 13 and containing a quantum well layer 10 having a grating constant larger by 2% or more than a grating constant of the InP substrate 13, the quantum well layer 10 is formed at a growth temperature of 440 to 510C and at a growth rate of 1.5 m/hour or larger.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种量子阱结构,其能够改善特性的性能,从而获得具有In组成比传统厚度厚的In组成大的晶体的量子阱结构作为量子阱层,光限制型量子阱结构,半导体。激光,分布式反馈半导体激光器,光谱仪和量子阱结构的制造方法;解决方案:通过有机金属气相生长法在InP衬底13上形成的量子阱结构中,该量子阱结构包含具有光栅的量子阱层10常数阱比InP衬底13的光栅常数大2%或更多,量子阱层10在440到510°C的生长温度和1.5 m / h或更大的生长速率下形成。 )2009,日本特许厅

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