ETCHING LIQUID, AND METHOD FOR FORMING CONDUCTOR PATTERN

摘要

PPROBLEM TO BE SOLVED: To provide an etching liquid for copper which can perform etching while maintaining the top shape of a pattern even if being continuously or repeatedly used, and to provide a method for forming a conductor pattern using the same. PSOLUTION: The etching liquid for copper comprises: a cupric ion source; an acid; and water, and comprises: azole having only nitrogen atoms as heteroatoms in the ring; and at least one of aromatic compound selected from phenols and aromatic amines. Further, the method for forming a conductor pattern is characterized in that the part which has not been coated with an etching resist (3) in a copper layer on an electrical insulating material (3) is etched using the etching liquid, so as to form a conductor pattern (2). PCOPYRIGHT: (C)2009,JPO&INPIT