首页> 外国专利> ELECTRON BEAM DRAWING DEVICE AND CURRENT DENSITY ADJUSTMENT METHOD FOR ELECTRON BEAM

ELECTRON BEAM DRAWING DEVICE AND CURRENT DENSITY ADJUSTMENT METHOD FOR ELECTRON BEAM

机译:电子束拉拔装置及电子束的电流密度调整方法

摘要

PROBLEM TO BE SOLVED: To provide a device and method that can adjust the current density of an electron beam during drawing.;SOLUTION: The drawing device 100 includes: an electron gun 201 which emits an electron beam 200; an electron gun power source 230 which receives a control value and controls the electron gun 201 based upon the control value; a current density measuring section 242 which measures the current density of the electron beam 200 a plurality of times while drawing on a sample is performed; and a PID control section 244 which calculates the control value varying with the measured current density so that the current density becomes nearly constant each time the current density is measured, and outputs the control value to the electron gun power source 230 each time the control value is calculated. The current density of the electron beam can be consequently kept nearly constant during the drawing.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种可以在绘制期间调节电子束的电流密度的装置和方法。解决方案:绘制装置100包括:发射电子束200的电子枪201;电子枪电源230,其接收控制值并基于该控制值控制电子枪201;执行电流密度测量部分242,该电流密度测量部分242在吸取样品的同时多次测量电子束200的电流密度。 PID控制部分244,其计算随所测量的电流密度而变化的控制值,使得每次测量电流密度时电流密度几乎恒定,并且每次将控制值输出至电子枪电源230计算。因此,在绘制过程中,电子束的电流密度几乎可以保持恒定。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009010078A

    专利类型

  • 公开/公告日2009-01-15

    原文格式PDF

  • 申请/专利权人 NUFLARE TECHNOLOGY INC;

    申请/专利号JP20070168520

  • 发明设计人 SAITO KENICHI;

    申请日2007-06-27

  • 分类号H01L21/027;H01J37/305;H01J37/06;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:27

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号