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NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE HEAD WITH NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE APPARATUS EQUIPPED WITH LIQUID DROPLET DISCHARGE HEAD, AND METHOD FOR MANUFACTURING NOZZLE SUBSTRATE MADE OF SILICON
NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE HEAD WITH NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE APPARATUS EQUIPPED WITH LIQUID DROPLET DISCHARGE HEAD, AND METHOD FOR MANUFACTURING NOZZLE SUBSTRATE MADE OF SILICON
PROBLEM TO BE SOLVED: To provide a nozzle substrate made of silicon excelling in durability and water repellency without causing corrosion of a liquid droplet discharge surface and a nozzle hole internal wall by a discharge liquid.;SOLUTION: A nozzle hole 11 is provided for discharging liquid droplets, and a discharge liquid resistant protective film 13 is continuously formed from the liquid droplet discharge side surface 1a of the nozzle hole 11 to the internal wall 11c of the nozzle hole 11. Unevenness is formed on the liquid droplet discharge side surface 1a of the discharge liquid resistant protective film 13, and a water repellent film 14 is further formed along the uneven surface of the discharge liquid resistant protective film 13. A protective film 12 is continuously provided from the internal wall 11c of the nozzle hole 11 to a joint surface 1b, and the discharge liquid resistant protective film 13 is continuously provided on the protective film 12. The internal wall 11c of the nozzle hole 11 is subjected to hydrophilic treatment with a discharge port edge part 11d as a border. The discharge liquid resistant protective film 13 is a film formed of DLC, and the height of unevenness of the discharge liquid resistant protective film 13 ranges from several tens of nanometers to several micrometers. A water repellent film 14 is a film formed of fluorine-containing organic silicon compound.;COPYRIGHT: (C)2009,JPO&INPIT
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