首页> 外国专利> NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE HEAD WITH NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE APPARATUS EQUIPPED WITH LIQUID DROPLET DISCHARGE HEAD, AND METHOD FOR MANUFACTURING NOZZLE SUBSTRATE MADE OF SILICON

NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE HEAD WITH NOZZLE SUBSTRATE MADE OF SILICON, LIQUID DROPLET DISCHARGE APPARATUS EQUIPPED WITH LIQUID DROPLET DISCHARGE HEAD, AND METHOD FOR MANUFACTURING NOZZLE SUBSTRATE MADE OF SILICON

机译:硅制成的喷嘴基料,具有硅制成的喷嘴基料的液体滴头,配备有液体滴头的液式滴头装置以及制造硅制成的喷嘴基料的方法

摘要

PROBLEM TO BE SOLVED: To provide a nozzle substrate made of silicon excelling in durability and water repellency without causing corrosion of a liquid droplet discharge surface and a nozzle hole internal wall by a discharge liquid.;SOLUTION: A nozzle hole 11 is provided for discharging liquid droplets, and a discharge liquid resistant protective film 13 is continuously formed from the liquid droplet discharge side surface 1a of the nozzle hole 11 to the internal wall 11c of the nozzle hole 11. Unevenness is formed on the liquid droplet discharge side surface 1a of the discharge liquid resistant protective film 13, and a water repellent film 14 is further formed along the uneven surface of the discharge liquid resistant protective film 13. A protective film 12 is continuously provided from the internal wall 11c of the nozzle hole 11 to a joint surface 1b, and the discharge liquid resistant protective film 13 is continuously provided on the protective film 12. The internal wall 11c of the nozzle hole 11 is subjected to hydrophilic treatment with a discharge port edge part 11d as a border. The discharge liquid resistant protective film 13 is a film formed of DLC, and the height of unevenness of the discharge liquid resistant protective film 13 ranges from several tens of nanometers to several micrometers. A water repellent film 14 is a film formed of fluorine-containing organic silicon compound.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种由硅制成的喷嘴基板,其耐用性和防水性优异,而不会导致液滴排出表面和喷嘴孔内壁被排出液腐蚀。;解决方案:提供用于排出的喷嘴孔11液滴,从喷嘴孔11的液滴排出侧面1a到喷嘴孔11的内壁11c连续地形成耐吐液保护膜13。在喷嘴11的液滴排出侧面1a上形成凹凸。防喷液保护膜13,沿着防喷液保护膜13的凹凸面进一步形成疏水膜14。从喷孔11的内壁11c到接缝连续地设有保护膜12。表面1b,在保护膜12上连续设置耐吐液保护膜13。喷嘴孔11以排出口端部11d为边界进行亲水处理。耐排液保护膜13是由DLC形成的膜,且耐排液保护膜13的凹凸的高度在几十纳米至几微米的范围内。疏水膜14是由含氟有机硅化合物形成的膜。版权所有:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009113351A

    专利类型

  • 公开/公告日2009-05-28

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20070289319

  • 发明设计人 ITODA MOTOKI;

    申请日2007-11-07

  • 分类号B41J2/135;

  • 国家 JP

  • 入库时间 2022-08-21 19:43:10

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