首页> 外国专利> SILICON-MADE NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE HEAD HAVING SILICON-MADE NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE APPARATUS EQUIPPED WITH LIQUID DROPLET DISCHARGE HEAD, AND METHOD FOR MANUFACTURING SILICON-MADE NOZZLE SUBSTRATE

SILICON-MADE NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE HEAD HAVING SILICON-MADE NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE APPARATUS EQUIPPED WITH LIQUID DROPLET DISCHARGE HEAD, AND METHOD FOR MANUFACTURING SILICON-MADE NOZZLE SUBSTRATE

机译:硅质喷嘴基质,具有硅质喷嘴基质,配备有液体液滴排放头的液体液滴排放装置,以及制造硅质喷嘴基质的方法

摘要

PROBLEM TO BE SOLVED: To provide a silicon-made nozzle substrate etc. which can improve assemblability by reducing mechanical stress and preventing chipping or breakage due to friction or the like during assembling while aligning with other substrates.;SOLUTION: The silicon-made nozzle substrate is provided with an alignment hole 15 and a truck hole 16 for aligning by inserting a positioning pin 51 when assembling with other substrates 2, 3, sectional areas of the holes 15, 16, parallel to a substrate surface, are gradually increased toward a liquid introduction surface 1b side, and shapes of sections vertical to the substrate surface have index curves. At this time, the alignment hole 15 is formed of a continued curved surface of a rotator having a central axis vertical to the substrate surface, and a sectional shape including the axis has linear symmetric index curves with the central axis as a symmetric axis. Angles formed by tangents of the sidewall of the alignment hole 15 and of the sidewall of the truck hole 16 at the liquid introduction surface 1b, and a perpendicular of the substrate surface are 0-10°.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种硅制喷嘴基材等,其可通过降低机械应力并防止在组装过程中与其他基板对准时因摩擦等原因而崩裂或破裂而提高可组装性;解决方案:硅制喷嘴基板上设置有对准孔15和载物台孔16,用于在与其他基板2、3组装时通过插入定位销51来对准,使孔15、16的平行于基板表面的截面积逐渐增大。液体导入面1b侧和与基板表面垂直的截面的形状具有折射率曲线。此时,对准孔15由具有垂直于基板表面的中心轴的旋转体的连续弯曲表面形成,并且包括该轴的截面形状具有以中心轴为对称轴的线性对称折射率曲线。对准孔15的侧壁和托架孔16的侧壁在液体引入表面1b处的切线与基板表面的垂直线所成的夹角为0-10°。版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2010173288A

    专利类型

  • 公开/公告日2010-08-12

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20090021219

  • 发明设计人 SANO AKIRA;OTANI KAZUFUMI;

    申请日2009-02-02

  • 分类号B41J2/135;

  • 国家 JP

  • 入库时间 2022-08-21 19:06:32

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