METHOD FOR PRODUCING SILICON-MADE NOZZLE SUBSTRATE, SILICON-MADE NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGING HEAD AND APPARATUS FOR DISCHARGING LIQUID DROPLET

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a silicon-made nozzle substrate, in which a processing time to form a nozzle throat is shortened and the number of materials to be used is made small, which is excellent in safety and in which the silicon-made nozzle substrate can be produced inexpensively.;SOLUTION: The method for producing the silicon-made nozzle substrate comprises the steps of: forming a film of a silicon-nitrogen compound 101 such as silazane on the surface of a silicon base material 1; firing the formed silicon-nitrogen compound 101 film; applying a resist 102 on the fired silicon-nitrogen compound 101 film to form an opening 102a; forming a liquid introduction-side nozzle throat part 110a whose diameter is made smaller gradually as it goes to the side of the silicon base material 100 on the silicon-nitrogen compound 101 film by wet-etching through the opening 102a formed on the resist 102; and forming a liquid discharge-side nozzle throat part 110b on the silicon base material 1 by dry-etching the fired silicon-nitrogen compound 101 film as a mask.;COPYRIGHT: (C)2010,JPO&INPIT