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Wire bonding properties and die bonding excellent in copper and copper-based alloy and method of manufacturing the same

机译:铜和铜基合金中优异的引线键合性能和芯片键合及其制造方法

摘要

PROBLEM TO BE SOLVED: To obtain good solderability in a die pat part without using flux by using an alloy in which crystal grain size lies in a specified range, and the center line average roughness (Ra) and the thickness of an oxidized film are controlled to the value equal to or below the specified one respectively. ;SOLUTION: By heat treatment, copper and copper base alloys having 10 to 150 μm crystal grain size, ≤0.15 μm center line average roughness (Ra) and ≤6 nm oxidized film thickness and excellent in wire bonding properties and die bonding properties are obtd. This copper and copper base alloys, which contain, by weight, 0.01 to 0.5% P or at least one kind from the group of Fe, Ni, Sn, Zn, Cr, Co, Si, Mg, Ti and Zr by 0.01 to 5.5% in total, and the balance Cu with inevitable impurities, are heat-treated at 300 to 900°C for 0.01 to 72 hr in an atmosphere of ≤5% oxygen concn. For stably joining a lead frame and a bonding wire, the surface roughness of the material is desirably controlled to 0.06 to 0.12 μm. By controlling the crystal grain size range to the above, solder uniformly spreads.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:通过使用晶粒尺寸在指定范围内的合金来控制裸片的良好焊接性而不使用助熔剂,并且控制中心线平均粗糙度(Ra)和氧化膜的厚度分别等于或小于指定的值。 ;解决方案:通过热处理,铜和铜基合金的晶粒尺寸为10到150μm,中心线平均粗糙度(Ra)为0.15μm,氧化膜厚度为6 nm,并且引线键合性能优异和裸片键合特性。这种铜和铜基合金,按重量计含有0.01至0.5%的P或Fe,Ni,Sn,Zn,Cr,Co,Si,Mg,Ti和Zr中的至少一种,含量为0.01至5.5在总氧气浓度为5%的气氛中,将总含量为5%的余量和剩余不可避免的杂质Cu在300至900℃下热处理0.01至72小时。为了稳定地连接引线框架和键合线,希望将材料的表面粗糙度控制在0.06至0.12μm。通过将晶粒尺寸控制在上述范围内,焊锡均匀分布。;版权所有:(C)2000,JPO

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